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Atomistic approach to Chemical Vapor
Deposition
Chemical
Vapor Deposition processes allow to obtain functional materials with tailored size-structure
relationships from molecular precursors. Sublimated precursors are driven by a
gas flow on suitable substrates heated at high temperatures,
typically in the 250-550˚ C range, where deposition and materials
growth occurs. Our group and the
experimental nanochemistry group at Padova University (Dr.
Davide Barreca) jointly
endeavoured the challenge to explore the complexity of these processes by
modeling the behaviour of complex molecular species on hot surfaces.
References:
G. Bandoli, D. Barreca, A. Gasparotto, R.
Seraglia, E. Tondello, A. Devi, R.A. Fischer, M. Winter, E. Fois, A. Gamba,
G. Tabacchi, “An integrated experimental and theoretical investigation on
Cu(hfa)2·TMEDA: structure, bonding and reactivity”, Phys. Chem. Chem. Phys. 2009, 11, 5998. (hot paper)
A. Gasparotto,
D. Barreca, A. Devi, R. Fischer, E. Fois, A. Gamba, C. Maccato, R.
Seraglia, G. Tabacchi, E. Tondello, “Innovative M(hfa)2•TMEDA
(M=Cu, Co) Precursors for the CVD of Copper-Cobalt Oxides: an Integrated
Theoretical and Experimental Approach”, ECS Transactions, 2009,
.8; 549.
http://dx.doi.org/10.1149/1.3207638
E.
Fois, G. Tabacchi, D. Barreca, A. Gasparotto, E. Tondello ““Hot” Surface Activation of Molecular
Complexes: Insight from Modeling Studies”, Angewandte Chemie , doi:
10.1002/anie.200907312 (hot paper) (Highlighted on the Nature
Chemistry website doi:10.1038/nchem.612)
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